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High-resolution, High-Throughput, CMOS-compatible Electron-Beam Patterning

Melissa A. Smith,Steven A. Vitale,Theodore H. Fedynyshyn,Matthew T. Cook, Joel Maldonado,Dmitri Shapiro,Mordechai Rothschild

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE（2017）

Cited 5|Views28
Key words
Scanning electron beam lithography,chemically-amplified resists,JSR1682J-30,AZnLOF2020
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