Layout-Dependent Effect Evaluation Of Transistor Array-Style Phase Locked Loop

PROCEEDINGS OF THE 2016 IEEE REGION 10 CONFERENCE (TENCON)(2016)

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摘要
The transistor array(TA)-style is a layout methodology where an analog layout is configured on the pattern such that unit-transistors of the same size form an array. It contributes to an easy implementation of design automation, and it also serves a design to mitigate the process variability in 90nm beyond. In this work, utilizing a phase locked loop(PLL) circuit as a motif, we verify the relationship between the fine processes and TA-style. We generate the layouts of the PLL based on the TA-style on 0.6um, 180nm, 65nm in three processes, and compare them with respect to the area and the post-layout simulation results of the control voltage of the VCO. Besides, we also generate a custom layout in 0.6um process, and report the comparison result with the TA-style one.
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关键词
TA-style,post-layout simulation,VCO,PLL circuit,process variability mitigation,design automation,transistor array-style phase locked loop circuit,layout-dependent effect evaluation,size 0.6 mum,size 180 nm,size 65 nm
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