Sputtering measurements using a quartz crystal microbalance as a catcher

A quartz crystal microbalance (QCM) catcher setup for sputter yield measurements is described. In this setup a QCM is placed next to the sputter target and acts as a catcher for sputtered material. The sputter yield evaluation relies on assumptions about the angular distribution of sputtered particles and reflected primary projectiles taken from simulations as well as on the knowledge of the sticking coefficient. To test this new setup a second QCM with a Au layer was used as a sputter target. The measured ratio between target and catcher signal is well reproduced in the simulations demonstrating the feasibility of reconstructing the sputtering yield from the catcher signal.