Current status and prospects of nanoimprint technology
2016 IEEE 16th International Conference on Nanotechnology (IEEE-NANO)（2016）
摘要
Nanoimprint is an emerging lithographic technology that promises high-throughput patterning of nanostructures. Based on the mechanical embossing principle, nanoimprint technique can achieve pattern resolutions beyond the limitations set by the light diffractions or beam scatterings in other conventional techniques. Nanoimprint can be applied to optical device, magnetic device, LSI device and so on.
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关键词
LSI device,magnetic device,optical device,beam scatterings,light diffractions,pattern resolutions,nanostructure patterning,mechanical embossing principle,lithographic technology,nanoimprint technology
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