A comprehensive solution for BEOL variation characterization and modeling

Katherine H. Chiang,Jun-Fu Huang, Tai-Yu Cheng,Cheng Hsiao, Joshua Sun, Chun Cheng, Kuo-Pei Lu,Ke-Wei Su,Chung-Kai Lin, Kevin Chen, King-Ho Tam, Te-Yu Liu, Ke-Ying Su,Min-Chie Jeng

2016 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)(2016)

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摘要
A comprehensive variation model is critical to achieve both competitive design and manufacturing yield in advanced technologies. Conventionally, as long as FEOL (front end of line) statistical model is appropriate, BEOL (back end of line) variations given by lumping multiple variation sources into few corners is enough to achieve reliable simulation results. However, as BEOL contribution is becoming more important with device scaling, simulation results with conventional corner model may not always produce optimal design margin. We thus propose a more comprehensive solution for BEOL variations characterization and modeling associated with statistical Monte Carlo simulation.
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关键词
Process variation,Monte Carlo,Statistical model,Global variation,Local variation,Correlation,BEOL
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