A RHEED/MBE-STM investigation of the static and dynamic InAs(001) surface

Journal of Crystal Growth(2017)

引用 2|浏览1
暂无评分
摘要
We report here the temperature-dependent incorporation kinetics of dimeric arsenic in InAs(001) homoepitaxy, using reflection high-energy electron diffraction (RHEED). Surface reconstructions, in combination with the RHEED investigation have provided insight into the growth of InAs(001), developing an accurate method of controlling the V:III ratio, which has been utilised to probe the low temperature epitaxial growth of indium arsenide epitaxial layers.
更多
查看译文
关键词
Reflection high energy electron diffraction,Molecular beam epitaxy,Arsenides,Semiconducting III-V materials
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要