Stacked Nanowires FETs: Mechanical robustness evaluation for sub-7nm nodes
2016 IEEE Silicon Nanoelectronics Workshop (SNW)(2016)
摘要
Stacked Nanowires FETs are proposed to replace FinFET and FDSOI for sub-7nm nodes. While most studies demonstrate the performances gain offered by such structures, mechanical stability of the suspended silicon channels needs to be considered. This paper provides a fully mechanical analytical description of nanowire stacks to explain the occurrence of buckling phenomena of silicon channels.
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关键词
stacked nanowires FET,FinFET,FDSOI,performances gain,mechanical stability,suspended silicon channels,nanowire stacks,buckling phenomena,mechanical robustness evaluation,size 7 nm
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