Precise Damage Observation in Ion-Beam Etched MTJ

Yuichi Ohsawa,Naoharu Shimomura,Tadaomi Daibou,Yuzo Kamiguchi,Satoshi Shirotori,Tomoaki Inokuchi,Daisuke Saida, B. Altansargai,Y. Kato,Hiroaki Yoda,T. Ohkubo,K. Hono

IEEE Transactions on Magnetics（2016）

引用 14|浏览59

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摘要

Patterning damage at the sidewall in a magnetic tunnel junction (MTJ) was observed precisely using a rectangular MTJ where deterioration in crystallinity is easier to identify than in the case of a dot-shaped conventional MTJ. A 200-500 nm-square rectangular MTJ was patterned by a 200 eV ion beam (IB). Cross-sectional transmission electron microscopy was used for damage observation. A bright-field...

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关键词

Magnetic tunneling,Etching,Image edge detection,Films,Atomic layer deposition,Diffraction,Amorphous magnetic materials

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