Electromigration characteristics of power grid like structures

Andrew Kim
Andrew Kim
Cathryn Christiansen
Cathryn Christiansen

IRPS, pp. 42018.

Cited by: 0|Views14
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Abstract:

Voltage drop (IR drop) and Electromigration (EM) reliability are two key related aspects for on-chip power grid design considerations. Good EM reliability ensures no EM induced void formation in the interconnect to cause a fatal resistance increase during product lifetime. It is important to understand the difference of EM characteristics...More

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