Electromigration characteristics of power grid like structures
IRPS, pp. 42018.
Voltage drop (IR drop) and Electromigration (EM) reliability are two key related aspects for on-chip power grid design considerations. Good EM reliability ensures no EM induced void formation in the interconnect to cause a fatal resistance increase during product lifetime. It is important to understand the difference of EM characteristics...More
Full Text (Upload PDF)
PPT (Upload PPT)