Subresolution Assist Feature Generation With Supervised Data Learning.

IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems(2018)

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摘要
Subresolution assist feature (SRAF) generation is a very important resolution enhancement technique to improve yield in modern semiconductor manufacturing process. Model-based and rule-based approaches are widely adopted in the semiconductor industry. The model-based SRAF generation can achieve a high accuracy but it is known to be time-consuming and it is hard to obtain consistent SRAFs on the sa...
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关键词
Optimization,Feature extraction,Lithography,Two dimensional displays,Layout,Training data,Data models
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