Nanostructuring methylammonium lead iodide perovskite by ultrafast nano imprinting lithography

We report the nanopatterning of the methylammonium lead iodide (MAPbI3) perovskite, a polycrystalline hybrid organic-inorganic semiconductor with very promising perspectives for photovoltaic and optoelectronic applications. Nanopatterning of MAI is obtained via Pulsed-NIL technology, an ultrafast version of the thermal nanoimprint lithography (NIL) based on stamps with integrated heaters. By Pulsed-NIL we were able to replicate onto the hybrid perovskite structures with details at the sub-100nm scale, in spite of its crystalline nature. This work shows a new possibility for the exploitation of organo-metal halide perovskites in optoelectronic devices with more complex architectures than just planar films. Display Omitted Methylammonium lead iodide thin film nanoimprinting approach is proposed.V-groove nanostructures are transferred to the photoactive material via Pulsed-NIL.The technique allows to perform the step in less than 1s.The preliminary trials show the possibility to scale up the process.