Bilinear Lithography Hotspot Detection

    ISPD, pp. 7-14, 2017.

    Cited by: 13|Bibtex|Views44|Links
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    Abstract:

    Advanced semiconductor process technologies are producing various circuit layout patterns, and it is essential to detect and eliminate problematic ones, which are called lithography hotspots. These hotspots are formed due to light diffraction and interference, which induces complex intrinsic structures within the formation process. Though...More

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