Predicting future complementary metal-oxide-semiconductor technology - challenges and approaches.

IET Computers & Digital Techniques(2016)

引用 0|浏览67
暂无评分
摘要
Long timescales and complex design processes require that CPU architects and microarchitects have early access to information about future manufacturing processes. In some cases, this means that future technology must be predicted in advance of it actually being developed. In addition, close collaboration with the foundries, known as `Design-Technology Co-Optimisation', or DTCO, allows the mutual ...
更多
查看译文
关键词
CMOS integrated circuits,integrated circuit design,microprocessor chips,semiconductor device manufacture
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要