Incorporating Process Variations Into SRAM Electromigration Reliability Assessment Using Atomic Flux Divergence.

IEEE Transactions on Very Large Scale Integration (VLSI) Systems(2016)

引用 9|浏览24
暂无评分
摘要
Electromigration (EM) greatly affects the long-term reliability of VLSI chips. Not only power/ground lines but also bitlines of SRAM arrays may be damaged by EM. In this paper, we analyze current flow on SRAM bitline, demonstrate that it may suffer EM due to the pulsed dc pattern, and conclude that bitline's EM reliability can dramatically be worsened by process variation due to a significant incr...
更多
查看译文
关键词
Integrated circuit reliability,Transistors,SRAM cells,Wires,Very large scale integration
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要