Stitch aware detailed placement for multiple e-beam lithography

Integration, Volume 58, 2017, Pages 47-54.

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Keywords:
electron beam lithographyintegrated circuit layoutmultiple electron beam lithographynext generation lithographyparallel beam printingMore(2+)

Abstract:

Abstract In multiple electron beam lithography (MEBL), a layout is split into stripes and the layout patterns are cut by stripe boundaries, then all the stripes are printed in parallel. If a via pattern or a vertical long wire is overlapping with a stitch, it may suffer from poor printing quality due to the so called stitch error ; the...More

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