Development of a Radiofrequency Plasma Diagnostic System with a Langmuir Probe and Study of a Capacitively Coupled Argon Plasma

LASER AND PLASMA APPLICATIONS IN MATERIALS SCIENCE(2011)

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摘要
A single rf-compensated cylindrical Langmuir probe has been developed in order to characterise a plasma RF discharge. A circuit using radiofrequency filtering and the passive compensation method was employed to minimize the probe curve distortions. The effect of the rf-compensation on the probe measurements was discussed. The latter were performed at power and pressure of 50 W and 5x10(-2)-1.2 mbar, respectively. Compensated measurements of the electron energy distribution function (EEDF) and plasma parameters were conducted at powers ranging from 5 to 120 W and pressure of 0.3 mbar. They exhibit a transition between the stochastic electron heating mode operating at low powers and the secondary-electron emission heating mode (7) operating at high powers. The electronic density increases from 1.5x10(9) to 3.2x10(10) cm(-3) while the effective electron temperature decreases from 3.7 to 2.3 eV. The EEDFs were found to be Druyvesteyn-like in the range of 5-80W and then evolve to the Maxwellian beyond 90W.
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关键词
Langmuir probe,rf plasma discharge,rf-compensation,Data acquisition
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