The use of x-ray capillary optics for lithography and microscopy

The possibilities of using x-ray capilary optics in lithography and microscopy are discussed. It has been shown experimentally that these systems, originally proposed by M. A. Kumakhov, may considerably simplify experimental designs. A micropinch x-ray source specially designed for these purposes has been successfully tested. The complete system constructed for laboratory use may serve as a prototype for an industrial lithography machine or microscope.