Incorporation Of Potassium Into Graphitic Films By Chemical Vapour Deposition

In this work we report on the synthesis of potassium intercalated into graphitic thin films by a chemical vapour deposition method. We use acrylic acid as a source of carbon and a solution of KOH in methanol as the source of potassium; the vapours of both compounds are thermally decomposed at 800 degrees C onto fused silica substrates to form thin films. Our analysis indicates that the material obtained consists of a mixture of stages I and II of potassium-oxygen graphite intercalation compounds.