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Use of Electrodeposition for Sample Preparation and Rejection Rate Prediction for Assay of Electroformed Ultra High Purity Copper for 232th and 238U Prior to Inductively Coupled Plasma Mass Spectrometry (ICP/MS)

E. W. Hoppe,C. E. Aalseth,R. Brodzinski,A. R. Day,O. T. Farmer,T. W. Hossbach,J. I. McIntyre,H. S. Miley, E. E. Mintzer,A. Seifert,J. E. Smart,G. A. Warren

Journal of Radioanalytical and Nuclear Chemistry（2008）

Cited 24|Views12
Key words
Uranium,Thorium,Rejection Rate,Uranium Concentration,Copper Electrode
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