Self-Aligned Quadruple Patterning-Aware Routing

DESIGN-PROCESS-TECHNOLOGY CO-OPTIMIZATION FOR MANUFACTURABILITY VIII(2014)

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摘要
Self-Aligned Quadruple Patterning (SAQP) is one of the most leading techniques in 14 nm node and beyond. However, the construction of feasible layout configurations must follow stricter constraints than in LELELE triple patterning process. Some SAQP layout decomposition methods were recently proposed. However, due to strict constraints required for feasible SAQP layout, the decomposition strategy considering an arbitrary layout does not seem realistic. In this paper, we propose a new routing method for feasible SAQP layout requiring no decomposition. Our method performs detailed routing by correct-by-construction approach and offers compliant layout configuration without any pitch conflict.
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关键词
Multiple patterning,Self-Aligned Quadruple Patterning,SAQP,Optical lithography,Routing,DFM
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