Interfacial Oxide Formation during Anodization of Hafnium/Aluminium Superimposed Layers

Christian M Siket,Maria Bendova,Cezarina C Mardare,Jaromir Hubalek,Siegfried Bauer,Achim Walter Hassel,Andrei Ionut Mardare

Electrochimica Acta（2015）

引用 6|浏览21

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摘要

•anodization of ultra-thin Hf films on Al was studied and analysed by XPS•small Hf grains uniformly cover much larger Al grains and their grain boundaries•hexagonal Hf (0001) was grown on (111) fcc Al with a lattice mismatch of 9 %•3-step anodic oxidation is found resulting in HfO2, HfO2/Al2O3 and Al2O3 stacks

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关键词

combinatorial libraries,high-throughput experimentation,scanning droplet cell microscopy,anodic oxide film,hafnium oxide

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