Characterization of Ultra-Thin PtSi Films for Infrared Detectors

Bender H., Roussel P., Siemens, Torres A., Donaton R. A., Maex K.,van der Sluis P.

SILICIDE THIN FILMS - FABRICATION, PROPERTIES, AND APPLICATIONS（2011）

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摘要

Transmission electron microscopy and grazing incidence X-ray diffraction are used for the structural characterization of ultra-thin PtSi layers on (100) silicon prepared by a two-step rapid thermal annealing process. The roughness of the layers is investigated with atomic force microscopy. Two deposition techniques for the initial Pt layer are compared.

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