FLUIDS, PLASMAS, AND ELECTRICAL DISCHARGES 261 Bombardment energies of O$ in low pressure reactive ion etching CONDENSED MATTER: STRUCTURE, MECHANICAL AND THERMAL PROPERTIES 264 X-ray absorption study of the atomic environment in Sb+ and Sb+/ Katsumi Nagase,Youichi Shimizu,Norio Miura,Noboru Yamazoe, E Martinet, Emmanuel Rosencher,Florence Saint Luc, E Costard,Neeraj J Agrawal, Dominique M Hoffmann,D Franke,Ulrich Clemens, Arthur Witt, Liz Price, Joan Walsh, K Rink, Guy P Delacretaz, R P Salathe, Joachim Janes, Christoph Huth, Alberto Armigliato, S Mantl, H L Bay, Yan Liu, Christopher S Yoo,W J Nellis, Michael Sattlermag（1992）引用 23|浏览2暂无评分关键词reactive ion etching,low pressureAI 理解论文溯源树样例生成溯源树，研究论文发展脉络Chat Paper正在生成论文摘要
