JSS FOCUS ISSUE ON ADVANCED INTERCONNECTS :M ATERIALS ,P ROCESSING, AND RELIABILITY Improved Plasma Resistance for Porous Low-k Dielectrics by Pore Stuffing Approach Liping Zhang,Sergej Naumov, A Zotovich,M R Baklanovmag(2015)引用 23|浏览1暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要