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Advanced (millisecond) Annealing in Silicon Based Semiconductor Manufacturing

S. Govindaraju, C. -L. Shih,P. Ramanarayanan, Y. -H. Lin,K. Knutson

ADVANCED GATE STACK, SOURCE/DRAIN, AND CHANNEL ENGINEERING FOR SI-BASED CMOS 6 NEW MATERIALS, PROCESSES, AND EQUIPMENT(2010)

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Key words
Nanoparticle Enhanced Absorption
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