Epitaxial High-K Oxide Metal Gate MOSFETs: Damascene CMP Process Integration and Electrical ResultsRalf Endres,Yordan Stefanov,Udo SchwalkeExtended Abstracts of the 2006 International Conference on Solid State Devices and Materials（2006）引用 0|浏览1暂无评分AI 理解论文溯源树样例生成溯源树，研究论文发展脉络Chat Paper正在生成论文摘要
