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Advanced Patterning Studies Using Shaped E-Beam Lithography for 65 Nm Cmos Pre-Production

L Pain,M Charpin,Y Laplanche,D Herisson,J Todeschini,R Palla,A Beverina, H Leininger, S Tourniol,M Broekaart, E Luce,F Judong, K Brosselin,Y Le Friec,F Leverd,S Del Medico,V De Jonghe,D Henry,M Woo,F Arnaud

EMERGING LITHOGRAPHIC TECHNOLOGIES VII, PTS 1 AND 2（2003）

Cited 12|Views8
Key words
E-Beam,lithography,photoresist,device
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