Method for non-selective shallow trench isolation reactive ion etch for patterning hybrid-oriented devices compatible with high-performance highly-integrated logic devices Gregory Costrini, D Dobuzinsky, Thomas S Kanarsky,Munir D Naeem,C D Sheraw, Richard Wisemag（2011）引用 26|浏览9暂无评分AI 理解论文溯源树样例生成溯源树，研究论文发展脉络Chat Paper正在生成论文摘要
