Suppression of Gate Depletion in p+ Polysilicon Gated Sub-40nm PMOS Devices by Laser Thermal ProcessT Yamamoto,Tadashi Kubo,K Okabe,Takae Sukegawa, Yixian Wang, Tianwei Lin,Somit Talwar,Masataka KaseExtended Abstracts of the 2004 International Conference on Solid State Devices and Materials（2004）引用 0|浏览12暂无评分AI 理解论文溯源树样例生成溯源树，研究论文发展脉络Chat Paper正在生成论文摘要
