A New Fabrication Technique For 2.75 Ghz Zno-Based Fbar Devices

Linh Mai,Jae-Young Lee,Van-Su Pham,Giwan Yoon

2008 17TH IEEE INTERNATIONAL SYMPOSIUM ON THE APPLICATIONS OF FERROELECTRICS（2008）

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摘要

We for the first time present a new fabrication technique of ZnO-based FBAR devices using a multi-layered Bragg reflector. To improve the resonance performance, 0.03 mu m-thick chromium (Cr)-adhesion layers were inserted into the Bragg, reflector and also thermal treatments were made to the devices. At operating frequency of about 2.75 GHz, very high return loss values and quality factor (Q) were observed under an optimum thermal annealing condition.

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关键词

fabrication,chromium,quality factor,zinc oxide,adhesives,thermal treatment,electrodes,resonance,sputtering,thermal annealing,annealing,q factor

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