Effect of lithography stitching errors on Silicon-on-Insulator photonic wires

M Gnan,Marc Sorel,D S Macintyre,P Pottier, S Thorns,R M De La Rue

international quantum electronics conference（2007）

引用 1|浏览3

暂无评分

摘要

Electron beam lithography (EBL) is a widely used tool in the patterning of photonic integrated circuits, either by direct writing or by UV lithography with e-beam defined masks. It provides the benefit of pattern flexibility, high accuracy and the required nanometre-scale resolution.

查看译文

关键词

lithography,attenuation,circuits,error correction,photonic integrated circuit,silicon on insulator,electron beam lithography,photonic integrated circuits,writing

AI 理解论文

溯源树

样例

生成溯源树，研究论文发展脉络

Chat Paper

正在生成论文摘要