Evaluation of diode-based and NMOS/Lnpn-based ESD protection strategies in a triple gate oxide thickness 0.13 µm CMOS logic technology

electrical overstress/electrostatic discharge symposium(2001)

引用 42|浏览17
暂无评分
摘要
In a 0.13 mum CMOS technology, ESD protection solutions based on NFETs and diodes are compared and their applicability for several groups of digital I/Os are discussed. In order to enable the use of these strategies, there are process requirements which need to be considered during the technology definition.
更多
查看译文
关键词
robustness,data mining,cmos technology,electrostatic discharge,logic gates,cmos integrated circuits
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要