Modeling of a DMOS transistor up to very high temperatures

CAS 2011 Proceedings (2011 International Semiconductor Conference)(2011)

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摘要
The emerging smart power BCD technologies allow smaller device sizes hence, under the same operating conditions, the device must dissipate the same amount of power on a much smaller area, which leads to a more pronounced self — heating effect. Therefore, accurate prediction of heat dissipation in the DMOS structure, up to thermal runaway, is necessary. We have designed a test structure capable of uniformly heating a small area VDMOS device up to 500°C. In this paper we validate the test structure by modeling the behavior of the DMOS transistor up to very high temperatures.
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关键词
DMOS transistor,high temperature,smart power BCD technology,heat dissipation,DMOS structure,thermal runaway,temperature 500 C
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