Mixed E-Beam Optical Lithography Process For The Fabrication Of Sub-0.25-Mu-M Poly Gates

Kt Kwietniak, Mg Rosenfield, Pj Coane, Cr Blair,Dp Klaus

ELECTRON-BEAM, X-RAY, AND ION-BEAM SUBMICROMETER LITHOGRAPHIES FOR MANUFACTURING III（1993）

引用 0|浏览0

暂无评分

关键词

process optimization,high resolution,cross section,metrology,electron beam,critical dimension,fabrication,optical lithography

AI 理解论文

溯源树

样例

生成溯源树，研究论文发展脉络

Chat Paper

正在生成论文摘要