Yield-Aware Mask Assignment Using Positive Semidefinite Relaxation In Lelecut Triple Patterning
DESIGN-PROCESS-TECHNOLOGY CO-OPTIMIZATION FOR MANUFACTURABILITY IX(2015)
摘要
LELECUT type triple patterning lithography is one of the most promising techniques in the next generation lithography. To prevent yield loss caused by overlay error, LELECUT mask assignment which is tolerant to overlay error is desired. In this paper, we propose a method that obtains an LELECUT assignment which is tolerant to overlay error. The proposed method uses positive semidefinite relaxation and randomized rounding technique. In our method, the cost function that takes the length of boundary of features determined by the cut mask into account is introduced.
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关键词
Triple Patterning, LELECUT, Design for Manufacturability, Positive Semidefinite Relaxation
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