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Optimization of Fullerene-Based Negative Tone Chemically Amplified Fullerene Resist for Extreme Ultraviolet Lithography

A. Frommhold,D. X. Yang,A. McClelland,X. Xue,Y. Ekinci,R. E. Palmer,A. P. G. Robinson

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE（2014）

Cited 13|Views8
Key words
EUV lithography,molecular resist,fullerene,chemically amplified resist
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