A Nanowire Transistor for High Performance Logic and Terabit Non-Volatile Memory Devices

2007 IEEE Symposium on VLSI Technology(2007)

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摘要
Silicon nanowire-FET (SiNAWI-FET) for high performance logic device with consideration of current direction effects and terabit non-volatile memory (NVM) device using an 8 nm SiNAWI-NVM with oxide/nitride/oxide (ONO) and omega-gate structure is reported for the first time. N-and P-channel SiNAWI-FET showed the highest driving current on (110)/<110> crystal orientation without device rotation, whereas most 3-dimensional NMOS report higher driving current on 45deg device rotation rather than 0deg. Utilizing an 7 nm spherical nanowire on the 8 nm SiNAWI-NVM with ONO structure, 1.7 V V T -window was achieved from 12 V/80 musec program conditions with retention enhancement.
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关键词
terabit nonvolatile memory devices,silicon nanowire-FET,high performance logic device,omega-gate structure,crystal orientation,3-dimensional NMOS,retention enhancement
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