2 8T SRAM bitcell is developed for a 14nm technology featu"/>

A 0.094um2 high density and aging resilient 8T SRAM with 14nm FinFET technology featuring 560mV VMIN with read and write assist

Symposium on VLSI Circuits-Digest of Papers(2015)

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摘要
A 0.094μm 2 8T SRAM bitcell is developed for a 14nm technology featuring FinFET transistors with a 70nm contacted gate pitch [1]. The bitcell and supporting circuitry are optimized for high density and aging tolerance. Supply collapse and wordline boosting techniques are applied for write V MIN assist. A delayed keeper is used for read V MIN improvement. A 400MHz V MIN of 560mV is achieved with the proposed design at -10°C in volume manufacturing.
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关键词
resilient 8T SRAM,read and write assist,SRAM bitcell,FinFET transistors,high density,aging tolerance,supply collapse,wordline boosting techniques,delayed keeper,size 70 nm,voltage 560 mV,temperature -10 degC
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