Band Alignment of HfO2/multilayer MoS2 Interface Determined by X-Ray Photoelectron Spectroscopy: Effect of CHF3 TreatmentXinke Liu,Jiazhu He,Qiang Liu,Dan Tang,Fang Jia,Jiao Wen,Youming Lu,Wenjie Yu,Deliang Zhu,Wenjun Liu,Peijiang Cao,Sun Han,Jisheng Pan,Zhubing He,Kah-Wee AngApplied physics letters（2015）引用 32|浏览33AI 理解论文溯源树样例生成溯源树，研究论文发展脉络Chat Paper正在生成论文摘要
