Reducing Contact Resistance In Ferroelectric Organic Transistors By Buffering The Semiconductor/Dielectric Interface

The reduction of contact resistance in ferroelectric organic field-effect transistors (Fe-OFETs) by buffering the interfacial polarization fluctuation was reported. An ultrathin poly(methyl methacrylate) layer was inserted between the ferroelectric polymer and organic semiconductor layers. The contact resistance was significantly reduced to 55 k Omega cm. By contrast, Fe-OFETs without buffering exhibited a significantly larger contact resistance of 260 k Omega cm. Results showed that such an enhanced charge injection was attributed to the buffering effect at the semiconductor/ferroelectric interface, which narrowed the trap distribution of the organic semiconductor in the contact region. The presented work provided an efficient method of lowering the contact resistance in Fe-OFETs, which is beneficial for the further development of Fe-OFETs. (C) 2015 AIP Publishing LLC.