RFCMOS Technology from 0.25μm to 65nm: the State of the Art

J Pekarik,D Greenberg,B Jagannathan,R Groves,JR Jones,R Singh,A Chinthakindi,X Wang,M Breitwisch,D Coolbaugh,P Cottrell,J Florkey,G Freeman,R Krishnasamy

PROCEEDINGS OF THE IEEE 2004 CUSTOM INTEGRATED CIRCUITS CONFERENCE（2004）

引用 39|浏览24

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CMOS integrated circuits,integrated circuit design,radiofrequency integrated circuits,0.25 micron to 65 nm,CMOS RFIC,FET device shrinkage,RFCMOS technology,low cost RF circuits,on-chip integration capacity,technology node scaling

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