Robust shallow trench isolation technique used for 75nm nor flash memory
Advanced Semiconductor Manufacturing Conference（2010）
关键词
flash memories,isolation technology,nor flash memory,composite pad dielectrics,in-situ steam generation liner oxide,oxide thinning effect,robust shallow trench isolation technique,self-aligned poly process,shallow trench isolation corner rounding profile,size 75 nm,tunnel oxide integrity,dielectrics,steam generator,shallow trench isolation,reliability,oxidation
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