Mapping Defect Density in MBE Grown Epitaxial Layers on Si Substrate Using Esaki Diode Valley Characteristics

IEEE Transactions on Electron Devices(2014)

引用 15|浏览4
暂无评分
摘要
Growing good quality III-V epitaxial layers on Si substrate is of utmost importance to produce next generation high-performance devices in a cost effective way. In this paper, using physical analysis and electrical measurements of Esaki diodes, fabricated using molecular beam epitaxy grown In0.53Ga0.47As layers on Si substrate, we show that the valley current density is strongly correlated with th...
更多
查看译文
关键词
Tunneling,Photonic band gap,Silicon,Current density,Stress,Temperature,Substrates
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要