A hashing mechanism for rule-based decomposition in Double Patterning Photolithography

In order for the semiconductor industry to continue to follow Moore's law, both designers and foundries needed to proceed to the 22nm nodes. However, this was stalled due to the delay of the deployment of Extreme Ultra-Violet (EUV) technologies. To counteract this delay, a new technology called Double Patterning Photolithography has emerged. This technology necessitates the effective automation of layout decomposition or splitting. In this paper, we propose a hashing mechanism that can be adopted as a basis for a rule-based splitting algorithm. Results have proven this mechanism as a valuable addition to the Double Patterning decomposition techniques. Our analysis and results show that this hashing technique has an approximately linear runtime.