Investigation of emerging middle-of-line poly gate-to-diffusion contact reliability issues

r kontra
r kontra
mahender kumar
mahender kumar
yun wang
yun wang
kai d feng
kai d feng

Reliability Physics Symposium, 2012, Pages 6A.4.1-6A.4.9.

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Abstract:

The minimum insulator spacing between the polysilicon control gate (PC) and the diffusion contacts (CA) in advanced VLSI circuits is aggressively shrinking due to continuous technology scaling. Meanwhile, rapid adoptions of new materials such as metal gate, epitaxial SiGe source /drain, stress liner, and copper contact together with new d...More

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