Light trapping in thin silicon solar cells

Photovoltaic Specialists Conference(2011)

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摘要
In this paper we present the design, optimization and characterization of a light trapping architecture that is applied to a thin, 50 micron, silicon solar cell structure. We combine a number of novel photonic engineering device concepts to realize the structure, including a single period hybrid dielectric-metallic back surface reflector and a host of diffraction gratings. We present a novel deep ultraviolet lithography process used in the realization of these gratings and a simulated analysis of their light trapping performance in the solar cell structure.
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关键词
diffraction gratings,elemental semiconductors,silicon,solar cells,ultraviolet lithography,deep-ultraviolet lithography process,light trapping performance,photonic engineering device,single-period hybrid dielectric-metallic back surface reflector,thin-silicon solar cells,absorption,diffraction grating,diffraction,design optimization
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