Design and Simulation Result of N Substrate Reverse Type Avalanche Photodiode (APD)

Mun, M.H., Jung, S.W.,Heedong Kang,Dosung Kim

Nuclear Science, IEEE Transactions(2009)

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摘要
We present results of design and simulation of the n-substrate reverse type avalanche photodiode (APD), which internally amplifies the photocurrent by an avalanche process, with the diffusion and the epitaxial methods.We aim to develop the APD which is coupled with scintillating materials for X-ray and gamma-ray detections. The purpose of this simulation is to investigate optimal design parameters including guarding of the reverse type APD to meet device performance requirement as one of detector components. These optimized conditions obtained from simulation study can be applied in fabrication of the reverse type APD.In this simulation, both process and device simulations of APDs have been done by using a 2D simulation package, Athena and Atlas, from Silvaco International. The n-substrate reverse type APD based on the optimized design parameters will be fabricated and tested in near future.
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关键词
X-ray detection,avalanche photodiodes,epitaxial growth,gamma-ray detection,semiconductor device models,2D simulation package,APD fabrication,Athena,Silvaco International,X-ray detection,avalanche process,delta-ray detection,device simulation,diffusion method,epitaxial method,internally amplified photocurrent,n-substrate reverse type avalanche photodiode design,optimal design parameters,scintillating material,Avalanche process,PMT,gain,photodiode
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