Voltage-dependent voltage-acceleration of oxide breakdown for ultra-thin oxides

Wu, E.Y.,Aitken, J., Nowak, E., Vayshenker, A.

San Francisco, CA, USA(2000)

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摘要
We report the voltage-dependence of voltage acceleration for ultra-thin oxides from 2.2 V to 5 V over a range of T/sub ox/ values from 1.7 nm to 5.0 nm. This unique behavior manifest itself as a power-law voltage-dependence for time-to-breakdown (T/sub BD/) over a variety of experimental observations. Using the concept of energy-to-breakdown, we explore the possible scenarios such as fractional energy or defect generation probability as a function of voltage to account for the increase in voltage acceleration with decreasing voltages.
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关键词
electric breakdown,insulating thin films,silicon compounds,2.2 to 5 V,SiO/sub 2/,defect generation,energy-to-breakdown,fractional energy,gate oxide breakdown,time-to-breakdown,ultrathin film,voltage acceleration,voltage dependence
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