Diamond mold for nanoimprint lithography

Tokyo, Japan(2000)

引用 0|浏览7
暂无评分
摘要
Nanoimprint lithography (NIL) is a major breakthrough in nano-patterning because it can produce sub-10 nm feature size over a large area with a high throughput and low cost. NIL fabricates a resist pattern by deforming the resist shape on the substrate using mold compression. In order to obtain high productivity the mold requires durability for repeatedly NIL process. Diamond is a candidate material for high productivity because it is the hardest material. Therefore, we fabricate diamond mold using electron beam lithography. Furthermore, using a diamond mold instead of diamond indenter of conventional hardness tester, direct nanoimprint becomes possible, in this case, nanoimprint experiment carries out very readily.
更多
查看译文
关键词
diamond,electron beam lithography,lithography,moulding,nanotechnology,c,diamond mold,nanoimprint lithography,nanolithography,argon,high throughput,fabrication,resists,etching,productivity,oxygen
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要