MOCVD Process Modeling Using In-Situ Reflectance Test Structure Measurements for Process Control Improvement

C Ebert,A Bond,J Levkoff,J Seiler,C Wanamaker

International Conference on Indium Phosphide and Related Materials, 2005

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III-V semiconductors,MOCVD,aluminium compounds,electro-optical modulation,gallium arsenide,indium compounds,reflectivity,semiconductor device models,semiconductor lasers,semiconductor process modelling,InGaAlAs,MOCVD process modeling,in-situ optical reflectance test structure,process control methodology,semiconductor laser manufacture,semiconductor modulator manufacture

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